MMI Cleanroom is a hub of precision nanofabrication in a controlled environment at Kaunas University of Technology and is managed by the Institute of Materials Science. Established in 2014, the 130 m² ISO5 (Class 100) cleanroom facility is open to the entire university community, as well as external academic and commercial partners. Equipped with cutting-edge technology and adhering to the highest industry standards, it provides an environment free from contaminants, ensuring optimal conditions for the needs of specific research activities.
The infrastructure of of the institute starting from 2019 is a part of EuroNanoLab that is is a distributed research infrastructure of 44 cleanrooms from 14 countries providing world-class nanofabrication services and expertise for exploratory research (low-TRL) to academic or industrial users. EuroNanoLab nodes are composed of cleanrooms that welcome any external users in an open-access mode.
 |
Electron beam lithography, electron microscopy and surface analysis system e-LiNE plus (Raith, Germany, 2013) System is used for nanolithography, nanostructuring and materials surface and composition analysis. Electron beam energy is changing in range 20 V–30 kV; 1 nm positioning accuracy in 100 × 100 mm field; diameter of round sample: up to 100 mm (4“), size of rectangular sample: up to 102 × 102 mm; magnification of scanning electron microscope with “in-lens” and Everhart-Thornley type detectors up to x1,000,000; energy resolution of energy dispersive spectrometer Bruker QUANTAX 200 with 5th generation Si detector: < 129 eV, allows to detect elements from Be (Z = 4) to Am (95). |
 |
Alignment and exposure system OAI Model 204 (SPS, Holand, 2014) Precision alignment with photomasks, exposure of thin photoresist layers by ultraviolet rays. Suitable for round substrates with diameters of 50, 76, 102 mm and for non-standard samples which are at least 5 × 5 mm2 in size, substrate thickness: up to 1 mm, thickness of photomask: up to 4.8 mm. The distance between the substrate and photomask is adjustable up to 50 μm. Ranges of ultraviolet light wavelengths: UV400: 350–450 nm; UV300: 280–350 nm; UV250: 240–260 nm (deep UV radiation). UV nanoimprint lithography supplement, supplement of double-sided alignment using infrared light. Power of exposure source: 500 W. Deviation of illumination uniformity does not exceed 3 %. Resolution: no less than 0.5 µm. |
 |
Spin coater SPS POLOS MCD200 NPP and hotplate SPS POLOS Hotplate200S is a versatile system designed for coating substrates with a diameter of up to Ø 260mm. Constructed with a full-plastic system in polypropylene NPP and features a transparent flat lid with a central opening for manual chemical dispense. The spin-coater has an easy, step-by-step programming with precise control over time (1-999 sec/step), speed (1-10,000 rpm), acceleration/deceleration (1-5,000 rpm/sec), and vacuum on/off. Safety features include a door interlock preventing the motor from running with the lid opened. The spin-coater includes a vacuum chuck for small sample chips. |
 |
Inductively coupled plasma reactive ion etching system Plasma-Therm Apex SLR ICP Deep reactive ion etching for microfabrication processes and formation of nanostructures. Uniformly etched area diameter: 15 cm. |
 |
Vacuum evaporation equipment A7000E is used for fabrication of metal and dielectric films. It is oriented to production of optical interference filters and Fabry–Perot optical filters. Optical system with scanning monochromator enables control of the optical thickness of formed dialectical films. At the same time, thickness is measured using quartz thickness meter. Parameters of the equipment: Two 15 kW power electron guns; Two 4 kW power resistive evaporators; Substrate temperature: 20–400 °C; Vacuum in a chamber: 10-3 Pa; |
 |
Vacuum evaporation equipment CUBIVAPT is used for fabrication of metallic and dielectric films. The thickness of formed samples is controlled by microprocessor and quartz thickness meter. Parameters of the equipment: Vacuum in a chamber 10-4–10-5 Pa; Two 6 kW power electron guns with four rotating position crucibles. Substrates temperature: 20–400 °C. |
 |
Acid/Base Wetbench is a specialized workspace tailored for handling acids and bases in the cleanroom. Built with corrosion-resistant materials, this bench ensures a safe and contamination-free setting for critical processes. |
 |
Solvent Wetbench is a specialized workspace tailored for handling solvents in the cleanroom. Built with stainless steel, this bench ensures a safe and contamination-free setting for critical processes. The wetbench is equipped with an ultrasonic bath. |
 |
Scanning probe microscopy system NanoWizard®3 NanoScience with supplements (JPK instruments AG, Germany) Measurement of surface topography and mechanical, electrical and magnetic properties in air and liquids. Suitable for characterisation of solids, polymers, biological samples and molecules. Also suitable for nanomanipulation and nanolithography. Working modes: contact, tapping, non-contact; microscopy of lateral force; record of phasic image; force modulation distribution (force mapping); quantitative representation: surface image based on force curves; magnetic force microscopy; force-distance spectroscopy; force-distance volume imaging mode; nanolithograhy and nanomanipulation; conduction microscopy with I/V curves registration; Kelvin probe force microscopy; capacitive microscopy. Scanning field: 100 × 100 µm; height up to 15 µm. Samples up to 100 mm in diameter and 50 mm in height. |
 |
Nikon Eclipse LV150N microscope is a high-performance imaging instrument designed for advanced research and industrial applications. With a focus on optical clarity and versatility, this microscope features 5x, 20x, 50x, and 100x Plan Fluor objectives that deliver sharp and detailed images. The LV150N is equipped with brightfield and darkfield imaging modes, and simple polarizing capabilities. |
