The patent “Fabrication method of holographic security label / inventors: V. Grigaliunas, S. Tamulevicius, M. Andrulevicius, T. Tamulevicius, E. Fataraite-Urboniene, P. Narmontas, T. Klinavicius, D. Jucius, M. Juodenas” has been granted by the European Patent Office (EPO, EP3896529B1: 2024-08-28), United States Patent and Trademark Office (USPTO, US11846888B2: 2023-12-19) and Japan Patent Office (JPO, JP7000647B2: 2022-01-19).
The present invention discloses a new method that allows one to combine different hologram origination technologies with high precision. Combining electron beam lithography and a dot matrix hologram in one layer provides a higher level of protection for the security holograms.
